NEW METHODS IN MATERIALS RESEARCH
USING FOCUSED ION BEAMS

Robert Hull
Department of Materials Science and Eng., Rensselaer Polytechnic Institute, Troy, USA

Focused ion beam technology offers many novel routes for nanoscale fabrication and characterization.  In this presentation I summarize examples of new routes to nanoscale patterning, fabrication and property modification developed in our group, drawing upon examples of ultra-fast patterning in PMMA, templating of nanostructure growth in the Ge/Si system, and local doping of individual semiconductor nanostructures.  I also describe application of focused ion beams to nanoscale characterization methods, including nanoscale mapping of semiconductor dopants and three-dimensional reconstruction of assembly of nanostructure arrays.  Prospects for new FIB capabilities for enhanced nano-fabrication and characterization methods will also be assessed.  Work in collaboration with M. Gerasimova, J. Graham, L. He, A. Kubis (U. Virginia), D. Dunn, F.M. Ross (IBM), S. Liu (Intel), A. Portavoce (CNRS), F. Stevie (NCSU), J. Johansson (Lund U).